PlasmaPOD™ Family
Compact Plasma Solutions
Advanced Vacuum by Plasma-Therm proudly offers the PlasmaPOD™—a line of compact, table-top plasma systems designed for high-performance results in space-limited environments.
Born from Plasma-Therm’s acquisition of JLS Designs Ltd. (UK), the PlasmaPOD™ family brings proven capability to:
University labs—ideal for material science research and teaching
R&D teams—enabling low-cost development for small to mid-size manufacturers
Failure analysis labs—where both space and budget matter
Now available through our new e-commerce platform, PlasmaPOD™ systems can be explored, configured, and purchased directly—streamlining your path from research to results.
Available PlasmaPOD™ Toolsets:
Reactive Ion Etch (RIE)
Plasma-Enhanced Chemical Vapor Deposition (PECVD)
Sputter Deposition (4 configurations)
Barrel Etch (2 configurations)
Whether you’re innovating at a startup or educating the next generation of engineers, Advanced Vacuum’s PlasmaPOD™ delivers the plasma performance you need—without the footprint or overhead.
Explore the lineup today and discover the power of precision in a compact package.
Barrel Etch
- Choice of 300W or 600W RF Generator with auto-matching
- Stainless Steel chamber with Aluminum Faraday Cage assembly
- 2 gas lines (inc MFCs)
- Internal PLC control system
- Touch-screen interface
- Capacitance manometer for pressure measurement
- Automatic closed-loop pressure control
- All controls are within the frame to minimize the footprint
- Built-in process recipe control and data logging


Sputter Deposition
- 300W RF Generator with auto-matching
- Stainless Steel chamber with internal shields
- 160mm electrode with rotation (optional water cooling)
- 2 gas lines (inc. MFCs)
- 3 configurations of Magnetrons plus fittings are available
- Internal PLC control system
- Touch-screen interface
- Automatic closed-loop pressure control
- Close-coupled Turbo (requires backing pump)
- All control within the frame to minimize the footprint
- Built-in process recipe control and data logging
PECVD
- 300W RF Generator with auto-matching
- Aluminium chamber with water cooling
- 240mm Heated electrode manufactured in stainless steel
- Internal PLC control system
- Touch-screen interface
- Capacitance manometer for pressure measurement
- Automatic closed-loop pressure control
- All control within the frame to minimize the footprint
- Built in process recipe control and data logging


RIE
- 300W RF Generator with auto-matching
- Aluminum chamber
- 125mm electrode; water-cooled
- Internal PLC control system
- Touch-screen interface
- Capacitance manometer gauge for pressure measurement
- Automatic closed loop pressure control
- Close-coupled turbo
- All control within the frame to minimize the footprint
- Built-in process recipe control and data logging