PlasmaPOD™ Family

Compact Plasma Solutions

Advanced Vacuum by Plasma-Therm proudly offers the PlasmaPOD™—a line of compact, table-top plasma systems designed for high-performance results in space-limited environments.

Born from Plasma-Therm’s acquisition of JLS Designs Ltd. (UK), the PlasmaPOD™ family brings proven capability to:

  • University labs—ideal for material science research and teaching

  • R&D teams—enabling low-cost development for small to mid-size manufacturers

  • Failure analysis labs—where both space and budget matter

Now available through our new e-commerce platform, PlasmaPOD™ systems can be explored, configured, and purchased directly—streamlining your path from research to results.

Available PlasmaPOD™ Toolsets:

  • Reactive Ion Etch (RIE)

  • Plasma-Enhanced Chemical Vapor Deposition (PECVD)

  • Sputter Deposition (4 configurations)

  • Barrel Etch (2 configurations)

Whether you’re innovating at a startup or educating the next generation of engineers, Advanced Vacuum’s PlasmaPOD™ delivers the plasma performance you need—without the footprint or overhead.

Explore the lineup today and discover the power of precision in a compact package.

Barrel Etch

  • Choice of 300W or 600W RF Generator with auto-matching
  • Stainless Steel chamber with Aluminum Faraday Cage assembly
  • 2 gas lines (inc MFCs)
  • Internal PLC control system
  • Touch-screen interface
  • Capacitance manometer for pressure measurement
  • Automatic closed-loop pressure control
  • All controls are within the frame to minimize the footprint
  • Built-in process recipe control and data logging
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PlasmaPOD

Sputter Deposition

  • 300W RF Generator with auto-matching
  • Stainless Steel chamber with internal shields
  • 160mm electrode with rotation (optional water cooling)
  • 2 gas lines (inc. MFCs)
  • 3 configurations of Magnetrons plus fittings are available
  • Internal PLC control system
  • Touch-screen interface
  • Automatic closed-loop pressure control
  • Close-coupled Turbo (requires backing pump)
  • All control within the frame to minimize the footprint
  • Built-in process recipe control and data logging

PECVD

  • 300W RF Generator with auto-matching
  • Aluminium chamber with water cooling
  • 240mm Heated electrode manufactured in stainless steel
  • Internal PLC control system
  • Touch-screen interface
  • Capacitance manometer for pressure measurement
  • Automatic closed-loop pressure control
  • All control within the frame to minimize the footprint
  • Built in process recipe control and data logging
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PlasmaPOD_RIE_AVLogo_2025

RIE

  • 300W RF Generator with auto-matching
  • Aluminum chamber
  • 125mm electrode; water-cooled
  • Internal PLC control system
  • Touch-screen interface
  • Capacitance manometer gauge for pressure measurement
  • Automatic closed loop pressure control
  • Close-coupled turbo
  • All control within the frame to minimize the footprint
  • Built-in process recipe control and data logging
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