Plasma-Therm Receives Follow-On Order in Japan for Its Heatpulse RTP System For SiC Power MOSFET Devices Used in Automotive and EV Applications
SEMICON Japan, Tokyo, December 15, 2022 — Plasma-Therm, a leading manufacturer of plasma-process equipment for the semiconductor and compound semiconductor
Plasma-Therm Strengthens Presence in Europe to Collaborate With Customers on New Microelectronics Development
SEMICON Europa, Munich, Germany, November 15, 2022—Plasma-Therm, a leading manufacturer of plasma-process equipment for the semiconductor and compound semiconductor markets,
Plasma-Therm Rolls Out Redesigned Heatpulse Rapid Thermal Processing Platform to Meet Evolving Market Requirements
SEMICON West, San Francisco, Calif., July 12, 2022—Plasma-Therm, a leading manufacturer of plasma-process equipment for the semiconductor and compound semiconductor
A New Production Solution for High Selective and Low-Damage Etching of GaAs-Based Devices
Conventional reactive ion etching (RIE) has generally been used for selective etching of GaAs over AlGaAs. However, there is a
The Effects of Increasing the Aspect Ratio of GaAs Backside Vias
To support the current trend in industry of working towards higher via densities which could shrink via dimensions, we report
Assessing Deep Reactive Ion Etch (DRIE) at CNF
Cornell University’s Nanoscale Science and Technology Facility (CNF) recently took delivery of a VERSALINE® deep silicon dry etching system. The comprehensive
Optimization of Low Stress PECVD Silicon Nitride for GaAs Manufacturing
Unaxis solutions for plasma-enhanced chemical vapor deposition (PECVD) silicon nitride (SiNx) are used extensively in the production of GaAs devices.
Product Spotlight: Tegal™ Diode RIE Systems
Plasma-Therm® now offers the Tegal™ Diode Reactive Ion Etching (RIE) systems. The Tegal Diode RIE systems are industry-leading systems for
Etching the Future with the Cornell NanoScale Facility: Interview with Ron Olson and Vince Genova
Plasma-Therm had the pleasure of interviewing Ron Olson, Director of Operations at the Cornell Nanoscale Facility (CNF), as well as
